Physical Design and Mask Synthesis for Directed Self-Assembly Lithogra
HC runder Rücken kaschiert
Lieferzeit: Print on Demand - Lieferbar innerhalb von 3-5 Werktagen I
ISBN-13:
9783319762937
Veröffentl:
2018
Einband:
HC runder Rücken kaschiert
Erscheinungsdatum:
03.04.2018
Seiten:
152
Autor:
Youngsoo Shin
Gewicht:
401 g
Format:
241x160x14 mm
Serie:
NanoScience and Technology
Sprache:
Englisch
Beschreibung:
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Introduces a highly promising patterning solution for next generation technology
Introduction.- DSAL Manufacturability.- Placement Optimization for DSAL.- Placement Optimization for MP-DSAL Compliant Layout.- Redundant Via Insertion for DSAL.